Search results for: grundlagen-regelungstechnik

Electrical Instruments Elektrische Instrumente

Author : Anton E. Pannenborg
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Magnitude of magnetogyric ratio of Frequency, cis 1 v 1e electron v Subscript denoting value in 1-c/s inter- 4 1 val = P, ogee/2m= 2n X 3. 5218 X 10 seC (amp/m)-1 Total bandwidth to half-power, cis Vb 0 Dielectric loss angle = arc tan (E" / E') Collision frequency, cis Vc Cyclotron frequency = eBo/2nm Skin depth in a metal = VT2/wp, p, a)m Ve Os o 2 LI v Half-width of spectral line (from centre Plasma frequency= (in) V(N e/mEiJ cis vp 3 to half-power), cis Volume charge density=N e coulombs/m e Relative permittivity = E' - j c" Reflection factor 8 e 2 2 Electric space constant = (P, ct1 a Scattering cross section, m o EO 12 "'" 8. 85416 X 10- farad/m u Conductivity = a' - j a" mhos/m Efficiency Relaxation time T rJ Efficiency of antenna = Ae/A Transmission factor rJA - {} Relative temperature, deg K Spin-lattice relaxation time, sec ·1 q,){ Absorption index=ocit/2n Magnetic flux, webers o Wavelength, m Gravitational potential it t1J Wavelength in waveguide, m Susceptibility = X' - j X" Ag X Free-space wavelength, m w Angular frequency = 2n v rad/sec Ao Relative permeability = p, ' - jp," Angular velocity, rad/sec w Jl 2 p, Drift mobility of carriers, m/volt-sec Cyclotron angular frequency we BOHR'S magneton=p, eh/2m P, B o o = e Bo/m rad/sec 29 =1. 16529 X 10- weber-m 0 Subscript denoting d. c., static, or steady I. General principles. a) Electromagnetic radiation.

Process Control Engineering

Author : Martin Polke
File Size : 46.59 MB
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This book surveys methods, problems, and tools used in process control engineering. Its scope has been purposely made broad in order to permit an overall view of this subject. This book is intended both for interested nonspecialists who wish to become acquainted with the discipline of process control engineering and for process control engineers, who should find it helpful in identifying individual tasks and organizing them into a coherent whole. A central concern of this treatment is to arrive at a consistent and comprehensive way of thinking about process control engineering and to show how the several specialities can be organically fitted into this total view.

Enhancing Embedded Systems Simulation

Author : Christian Köhler
File Size : 37.62 MB
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Christian Köhler covers the connection between μC and simulation, the interface abstraction as well as the analysis and optimization of coupling systems with the Chip-Hardware-in-the-Loop Simulation (CHILS) approach. He develops the hardware to simulation coupling system with a focus on less hardware effort, the capabilities to couple with different simulation environments, and the efficiency of coupling. Furthermore, the author presents existing concepts to simulate complex systems and compares them with the new approach.

Proceedings of the 2nd European Simulation Congress Sept 9 12 1986 The Park Hotel Antwerp Belgium

Author : Philippe Geril
File Size : 60.38 MB
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Encyclopedia of physics

Author : Siegfried Flügge
File Size : 44.78 MB
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Elektrische Instrumente

Author : Anton Eduard Pannenborg
File Size : 87.73 MB
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Physiologie des Menschen

Author : R.F. Schmidt
File Size : 63.47 MB
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Ullmann s Encyclopedia of Industrial Chemistry

Author : Fritz Ullmann
File Size : 85.10 MB
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The Effect of the Vehicle Dynamics on the Light Distribution of Headlamps

Author : Peter Lehnert
File Size : 85.62 MB
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Intelligent Observer and Control Design for Nonlinear Systems

Author : Dierk Schröder
File Size : 76.50 MB
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This application-oriented monograph focuses on a novel and complex type of control systems. Written on an engineering level, including fundamentals, advanced methods and applications, the book applies techniques originating from new methods such as artificial intelligence, fuzzy logic, neural networks etc.